SiO2->Si->Mg2Si->SiH4

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The reaction pathway described above involves the conversion of silicon dioxide (SiO2) to magnesium silicide (Mg2Si) via the formation of elemental silicon (Si) and silicon tetrahydride (SiH4).

SiO2 → Si + O2: The first step involves the reduction of silicon dioxide to elemental silicon and oxygen gas. This can be achieved through a high-temperature chemical reduction process.

Si + Mg → Mg2Si: Elemental silicon reacts with magnesium to form magnesium silicide. This reaction typically occurs at elevated temperatures in a controlled environment.

Si + 2H2 → SiH4: Elemental silicon can also react with hydrogen gas to form silicon tetrahydride. This reaction is commonly used in the production of silicon-based materials and chemicals.

Overall, the reaction pathway described above involves the transformation of silicon dioxide into magnesium silicide through intermediate steps involving elemental silicon and silicon tetrahydride.